Friday, December 19, 2008

Gen Art Styles International Design Competition: Application period begins Jan 15

STYLES 2009:

Win a chance to present your designs at a high profile New York runway show and a $5,000 Award for Design Excellence at the show that launched Peter Som, Rodarte, Cloak, Sari Gueron, Loden Dager, Lulu Frost and more…

Who may apply
Those who have been designing under their own name for seven years or less. Aspiring designers and fashion students are eligible for entry.

How to apply
GENART.ORG for an online application between January 15th and March 17th, 2009.

All contestants must submit digital images of two complete outfits in any one or more of the following categories: Women’s Ready to Wear• Eveningwear • Avant-garde • Menswear • Accessories

Entry Fee: $25

How the finalists are selected
A Selection Committee of influential market editors, stylists, and buyers will review all submissions at a Prescreening Event in early April. The Committee will choose five finalists in each category. Submissions are reviewed blindly and each entry is judged only on the merits of the submitted designs. All finalists will be invited to participate in the Styles 2009 Fashion Show and accessories presentation on May 7th, 2009 in New York City in front of over 1500 industry and consumer guests.

A Fashion Panel will judge the designs presented and select a winner from each category who will receive a $5,000 Award for Design Excellence. Past panels have included designers Diane von Furstenberg, Norma Kamali, Betsey Johnson, Cynthia Rowley, Kate Spade, Michael Fink of Saks Fifth Avenue, Tim Gunn of Project Runway and stylist Patricia Field.

Click here for complete details on competition requirements